Photochemistry of asphaltene films. A study of the world's first photographic process and its invention by N. Niépce around 1824MARIGNIER, J. L.The Journal of imaging science and technology. 1996, Vol 40, Num 2, pp 123-133, issn 1062-3701Article

Anisotropic photoetching of III-V semiconductors. II, Kinetics and structural factorsVAN DE VEN, J; NABBEN, H. J. P.Journal of the Electrochemical Society. 1991, Vol 138, Num 1, pp 144-152, issn 0013-4651Article

Choosing a photoplotter for generating PWB artworkMCCALEB, W. L.Electri.onics. 1987, Vol 33, Num 7, pp 24-25, issn 0745-4309Article

Ultra-long glass tips for atomic force microscopyRUF, A; DIEBEL, J; ABRAHAM, M et al.Journal of micromechanics and microengineering (Print). 1996, Vol 6, Num 2, pp 254-260, issn 0960-1317Article

Photoetching effects in mercuric iodidePONPON, J. P; MONTGOMERY, P. C; SIESKIND, M et al.Applied surface science. 2000, Vol 165, Num 2-3, pp 233-240, issn 0169-4332Article

Fabrication technologies for microsystems utilizing photoetchable glassDIETRICH, T. R; EHRFELD, W; LACHER, M et al.Microelectronic engineering. 1996, Vol 30, Num 1-4, pp 497-504, issn 0167-9317Conference Paper

Laser-induced trench etching of GaAs in aqueous KOH solutionLEE, C; TAKAI, M; YADA, T et al.Applied physics. A, Solids and surfaces. 1990, Vol 51, Num 4, pp 340-343, issn 0721-7250Article

Reproducible nuclear magnetic resonance surface coil fabrication by combining computer-aided design and a photoresist processFAN, T. W.-M; HIGASHI, R. M.Analytical chemistry (Washington, DC). 1989, Vol 61, Num 6, pp 636-638, issn 0003-2700Article

Première réalisation de bétons photogravés coulés en place = First in-situ photo-engraved concrete buildingCahiers techniques du bâtiment. 2000, Num 205, pp 48-49, issn 0241-6794Article

L'excellence du marquage laser = Pre-eminence of laser markingVASSELLE, J. B.Plastiques modernes et élastomères. 1995, Vol 47, Num 6, pp 42-44, issn 0032-1303Article

Pulsed ultraviolet laser interactions with organic polymers : dependence of mechanism upon laser powerSRINIVASAN, R.Polymer degradation and stability. 1994, Vol 43, Num 1, pp 101-107, issn 0141-3910Article

The atomic processes of ultraviolet laser-induced etching of chlorinated silicon (1 1 1) surfaceAMASUGA, Hirotaka; NAKAMURA, Manami; MERA, Yutaka et al.Applied surface science. 2002, Vol 197-98, pp 577-580, issn 0169-4332, 4 p.Conference Paper

Polyimide resist for photoetching of fine ceramics in hot phosphoric acidMAKINO, E; SHIBATA, T; YAMADA, Y et al.Hyomen gijutsu. 1998, Vol 49, Num 6, pp 637-642, issn 0915-1869Article

Les premières expériences, les premières applications = First experiences, first applicationsColloque caractère. 1996, pp 53-84Conference Paper

An X-ray photoelectron spectroscopy study of poly(methyl methacrylate) surface modified by 193-nm laser radiationVAN SAARLOOS, P. P; VERNON, C. F; CHIRILA, T. V et al.Polymer bulletin (Berlin. Print). 1994, Vol 33, Num 3, pp 331-338, issn 0170-0839Article

A photothermal model for polymer ablation : chemical modificationCAIN, S. R.Journal of physical chemistry (1952). 1993, Vol 97, Num 29, pp 7572-7577, issn 0022-3654Article

Light-emitting porous silicon formed by photoetching in aqueous HF/KIO₃ solutionYAN KAI XU; ADACHI, Sadao.Journal of physics. D, Applied physics (Print). 2006, Vol 39, Num 21, pp 4572-4577, issn 0022-3727, 6 p.Article

Béton photogravé pour un gymnase alsacien = Photo engraved concrete for a gym in AlsaceCahiers techniques du bâtiment. 2002, Num 224, pp 24-25, issn 0241-6794Article

Si photo etching in Cl₂ gas using a high power Hg LampIKAWA, E; SUGIMOTO, S; KUROGI, Y et al.Surface science. 1987, Vol 183, Num 1-2, pp 276-288, issn 0039-6028Article

A study on the production of 950°C moiré gratings in metal materialsHUIMIN, X; DIETZ, P; SCHMIDT, A et al.Strain. 1997, Vol 33, Num 2, pp 53-56, issn 0039-2103Article

ASP: artwork specifications in prologHILL, E. F.ICL technical journal. 1988, Vol 6, Num 2, pp 321-335, issn 0142-1557Article

Mechanisms of water photooxidation at n-TiO₂ rutile single crystal oriented electrodes under UV illumination in competition with photocorrosionSALVADOR, Pedro.Progress in surface science. 2011, Vol 86, Num 1-2, pp 41-58, issn 0079-6816, 18 p.Article

Electrochemical etching of patterned Al (10 0) foils in HClBREVNOV, Dmitri A.Journal of micromechanics and microengineering (Print). 2008, Vol 18, Num 8, issn 0960-1317, 087001.1-087001.5Article

Reynolds number dependence of the drag coefficient for laminar flow through fine-scale photoetched screensO'HERN, T. J; TORCZYNSKI, J. R.Experiments in fluids. 1993, Vol 15, Num 1, pp 75-81, issn 0723-4864Article

Photoetching and modification of organic polymer surfaces with vacuum UV radiationTAKACS, G. A; VUKANOVIC, V; TRACY, D et al.Polymer degradation and stability. 1993, Vol 40, Num 1, pp 73-81, issn 0141-3910Article